Scientists from Tokyo Metropolitan University have developed a new electrode material for deep-ultraviolet (DUV) light-emitting diode applications. They used a cutting-edge deposition technique to form thin films of an alloy of tin oxide and germanium oxide with added tantalum, finding that they exhibit excellent electrical conductivity and unprecedented transparency for DUV light. The new electrodes promise to impact industry, as the same wavelengths are used for sterilization processes and the manufacture of microchips.