Peripheral photoinhibition (PPI) direct laser writing (DLW) is a lithography technique used to fabricate intricate 3D nanostructures that are widely employed in photonics and electronics. PPI-DLW uses two beams, one to excite the substrate and cause polymerization and the other to inhibit and quench the excitation at the edges. The capacity is limited in some systems, which can be improved through multifocal arrays. However, computing these beams is both time- and memory-intensive.