Research produces record levels of strain in single-crystal silicon
Published Date: 1/18/2022
Source: phys.org
University of Surrey researchers have developed a single-step procedure to put single-crystal silicon under more strain than has been achieved before. The discovery, which has a patent pending, could be crucial to the future development of silicon photonics, which underpins the technologies behind the internet-of-things, and is currently constrained by the lack of cheap, efficient, and easily integrated optical emitters.