Patterning silicon at the one-nanometer scale
Published Date: 8/12/2021
Source: phys.org
Researchers have developed an innovative technique for creating nanomaterials. These are materials only atoms wide. They draw on nanoscience to allow scientists to control their construction and behavior. The new electron beam nanofabrication technique, plasmon engineering, achieves unprecedented near-atomic scale control of patterning in silicon. Structures built using this approach produce record-high tuning of electro-optical properties.