Nanoscale applications in energy, optics and medicine have enhanced performance with nano-shaped structures. Such architectures can be fabricated at high-throughput beyond the capabilities of advanced optical lithography. In a new report on Microsystems & Nanoengineering, Anushman Cherala and a research team at the University of Texas at Austin Texas, U.S., expanded on nanoimprint lithography and extended the previous simulation framework to improve shape retention by varying the resist formula and introducing new bridge structures during nanoshape imprinting. The simulation study demonstrated viable approaches for nanoshaped imprinting with good shape retention matched by experimental data.